High-quality zirconium tin titanate (Zr0.8Sn0.2TiO4, ZST) thin films are deposited along the (100) plane on a p-type Si substrate by the sol–gel method. The effects of two different heat treatment temperatures, 250 and 450°C, for organic burn-out between each spin coating on the crystal structure, morphology, roughness and thickness of the films are investigated. X-ray diffraction confirms a pronounced preferred orientation in thinner films and a polycrystalline structure in thicker films. Microstructure analyses by scanning electronic microscopy (SEM) and atomic force microscopy (AFM) prove that a high-quality ZST film approximately 75 nm thick with a smooth surface (surface roughness of 4 nm) is obtained under suitable processing conditions.
JAPANESE JOURNAL OF APPLIED PHYSICS 44(7A),5125-5128